CHARACTERIZATION OF THIN FILMS OF NI/NIO COATED BY MAGNETRONS SPUTTERING FOR SOLAR APPLICATIONS IN SOLAR ABSORBERS
DOI:
https://doi.org/10.59627/cbens.2008.1385Keywords:
Ni/NiO coatings, magnetron sputtering, thermal absorptance, solar absorbersAbstract
In this present work, selective surfaces had been produced in chamber of vacuum with the use of cathodic deposition (“sputtering”) in the deposition of Ni-NiO in aluminum substrate. The pressure of the chamber was adjusted in 2x10-2mbar and the power 600W. The time for deposition of Ni varied of 10 to 60 minutes and the time for deposition of NiO of 10 to 90 minutes. The mixture of gases constituted of Argon (inert gas) and Oxygen (active gas). The percentage in volume of Oxygen varied of 20 to 50%. In layers coatings had been carried through duplex, constituting the first layer of Ni and the second, the layer of anti-reflection (AR) of Ni-NiO. The identification and the quantification of the phases were carried through by X-Ray Diffraction (XRD). The microstructure of the samples was examined to the Scanning Eletronic Microscope (SEM). The solar absortance was calculated from the measures of reflectance for Spectroscopy in the visible and near infrared. In some samples peaks of 99% of heat absorption had been reached. Films with better absorption of heat for applications in solar collectors, was prepared with the relation of the chemical composition, microstructure and the optic properties of these materials.
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References
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